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中国做不出高端光刻机?只成立几年的新凯来,专攻半导体产业薄弱环节,光刻机这一页终于翻过去了。

70,934 Aufrufe • vor 1 Jahr •via X (Twitter)

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最近,一家总投资约为50亿元的国产光刻机工厂在浙江绍兴市越城区正式落地。 这个项目由上海图双精密装备有限公司负责实施,预计将分两期建设。第一期计划投资约5亿元,用于转移和扩大公司目前在上海的产能;第二期计划投资约45亿元。整个项目完成后,将有望实现年产50至100台半导体设备的目标,预计2025年正式投产 。 项目的实施标志着中国在自主研发光刻机方面迈出了重要一步。光刻机作为半导体芯片制造的关键设备,其技术水平直接决定了芯片的工艺水平和性能。目前,全球光刻机市场主要被荷兰的ASML、日本的尼康和佳能等国际大厂垄断,尤其是最先进的EUV光刻机,全球仅ASML一家能够提供。上海图双精密装备有限公司的这个项目不仅将生产国产光刻机,还将对国外光刻机进行定制化改造和调试 。 近年来,美国和西方国家对中国芯片封锁,激发了中国自主研发光刻机的决心。上海电子集团成功研制出的28nm浸润式光刻机,便是这一努力的成果之一 。 这个项目有助于中国减少对外部高端光刻机的依赖,推动国内半导体产业的发展,提升中国在高端科技领域的自主研发能力。Recently, a domestically produced lithography machine factory with a total investment of approximately 5 billion yuan has officially landed in Yuecheng District, Shaoxing City, Zhejiang Province. The project is implemented by Shanghai Tushuang Precision Equipment Co., Ltd. and is expected to be constructed in two phases. The first phase plans to invest about 500 million yuan to transfer and expand the company's current capacity in Shanghai; the second phase plans to invest about 4.5 billion yuan. Upon completion of the entire project, it is expected to achieve an annual production capacity of 50 to 100 semiconductor machines, with a projected start of production in 2025. The implementation of this project marks an important step for China in the independent development of lithography machines. As a key equipment in semiconductor chip manufacturing, the technical level of lithography machines directly determines the process level and performance of the chips. Currently, the global lithography machine market is mainly dominated by international giants such as ASML from the Netherlands, Nikon and Canon from Japan, with only ASML being able to supply the most advanced EUV lithography machines worldwide. Shanghai Tushuang Precision Equipment Co., Ltd.'s project will not only produce domestic lithography machines but also carry out customized modifications and debugging of foreign lithography machines. In recent years, the chip blockade imposed by the United States and Western countries against China has spurred China's determination to independently develop lithography machines. The successful development of the 28nm immersion lithography machine by Shanghai Electronics Group is one of the outcomes of this effort. This project will help China reduce its dependence on external high-end lithography machines, promote the development of the domestic semiconductor industry, and enhance China's independent research and development capabilities in the field of high-end technology.

yanguoliusheng

67,898 Aufrufe • vor 2 Jahren